Electron Beam Lithography Contributions from JenaElectron beam litography can look back upon a successful develpment in Jena. After the year 1990, the competitive conditions have stiffened. on the other hand, it has become much easier to participate in international conferences exhibitions and to promote a worldwide exchange of ideas and views. Numerous innovations contributed to the technical and commercial attractiveness of the Jena tools (originally introduced tothe market under the names ZBA31
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Electron-beam litography can look back upon a successful develpment in Jena. After the year 1990, the competitive conditions have stiffened. on the other hand, it has become much easier to participate in international conferences/exhibitions and to promote a worldwide exchange of ideas and views. Numerous innovations contributed to the technical and commercial attractiveness of the Jena tools (originally introduced tothe market under the names ZBA31/32, SB250, SB350, SB3050), which found their way into many semiconductor production facilities, maskshops and research centers worldwide.